The vacuum magnetron sputtering SNT Vega (SNT-Vega vertical) equipment is a cost-effective solution for batch production. It stands out for high performance and uniformity of coating: the equipment allows to coat up to 65 substrates (60 * 48 mm) with a high ± 1% uniformity in batch. Oil-free pumping, ion-beam cleaning, resistance and temperature control, automated deposition process is a standard set of options for this type of equipment. Ion-beam spluttering, quartz control of coating thickness are options to choose.
| System | SNT Vega V | ||
| Deposition technology | DC magnetron sputtering, RF Magnetron sputtering (optional), Ion-beam cleaning | ||
| Applied materials | Any conductive material for DC (dielectric for RF), up to 4 materials in one deposition cycle | ||
| The vacuum chamber diameter, mm | 600 | ||
| System settings | |||
| Pumping system | High vacuum oil-free pumping | ||
| Ultimate vacuum, Pa | 5 х10-4 | ||
| Control of coatings | Quartz control system or Resistive control system or Time control system | ||
| Substrate holder | Planar type | ||
| Heating | IR | ||
| Coating thickness irregularity, % | ± 2.0 | ||
| Distinctive features | One-sided deposition, high performance | ||