The vacuum magnetron sputtering SNT VegaH (SNT Vega horizontal) equipment is a cost-effective solution for batch production. Oil-free pumping provides a pollution-free coating. The machinery is equipped with ion-beam cleaning, which ensures good adhesion of the deposited films. The coating control is carried out by the resistance on the control unit which is under the same conditions as the substrates. The control unit also provides temperature monitoring of the substrate. The equipment allows to coat from 18 to 56 substrates (60 * 48 mm) simultaneously in a single process, with guaranteed uniformity of resistance in the batch from ± 2% to 5%, respectively. The deposition of up to 3 different materials can be carried out simultaneously or sequentially in one deposition cycle. Optionally the equipment can be upgraded to double-sided simultaneous deposition on a substrate. The automation of the deposition process via convenient programming interface allows to carry out the deposition in compliance with the given technological recipe.
| System | SNT Vega H | ||
| Deposition technology | DC magnetron sputtering, RF Magnetron sputtering (optional), ion-beam cleaning | ||
| Applied materials | Any conductive material for DC (dielectric and semiconductors for RF), up to 3 materials in one deposition cycle | ||
| The vacuum chamber diameter, mm | 800 | ||
| System settings | |||
| Pumping system | High vacuum oil-free pumping | ||
| Ultimate vacuum, Pa | 5 х10-4 | ||
| Control of coatings | Resistive control system or Time control system | ||
| Substrate holder | Planar type | ||
| Heating | IR | ||
| Coating thickness irregularity, % | ± 2.0 - ± 5.0 | ||
| Distinctive features | Double-sided simultaneous deposition | ||