Modern version of classical equipment UVN-74 (УВН-74). Application – microelectronics.
Vacuum technological equipment SNT Taurus 74 is designed for single- and double-sided deposition of conductive or resistive layers. Proven deposition scheme allow using resistive and electronic (with an circular cathode) evaporation and magnetron sputtering. Taurus 74 is equipped with an ion-beam source for substrate cleaning and resistive control of deposition process. A quartz control system is an option of choice. The equipment can operate in automatic, semi-automatic and manual modes.
|System||SNT Taurus 74|
|Deposition technology||Magnetron sputtering, Electron evaporation, Resistive evaporation, Ion-beam assisting (option)|
|Substrate cleaning||Ion-beam cleaning|
|Applied materials||Metals, resistive compounds|
|Pumping system||High vacuum oil-free pumping|
|Ultimate vacuum, Pa||8 х10-5|
|Deposition control||Quartz control or/and Resistive control and Time control|
|Substrate size, mm||60х48; 30х24|
|Heating||up to 350°С|
|Coating thickness irregularity, %||no more than ± 5|
|Distinctive features||One-sided or double-sided deposition|