Modern version of classical equipment UVN-74 (УВН-74). Application – microelectronics.
Vacuum technological equipment SNT Taurus 74 is designed for single- and double-sided deposition of conductive or resistive layers. Proven deposition scheme allow using resistive and electronic (with an circular cathode) evaporation and magnetron sputtering. Taurus 74 is equipped with an ion-beam source for substrate cleaning and resistive control of deposition process. A quartz control system is an option of choice. The equipment can operate in automatic, semi-automatic and manual modes.
| System | SNT Taurus 74 | ||
| Deposition technology | Magnetron sputtering, Electron evaporation, Resistive evaporation, Ion-beam assisting (option) | ||
| Substrate cleaning | Ion-beam cleaning | ||
| Applied materials | Metals, resistive compounds | ||
| System settings | |||
| Pumping system | High vacuum oil-free pumping | ||
| Ultimate vacuum, Pa | 8 х10-5 | ||
| Deposition control | Quartz control or/and Resistive control and Time control | ||
| Substrate size, mm | 60х48; 30х24 | ||
| Heating | up to 350°С | ||
| Coating thickness irregularity, % | no more than ± 5 | ||
| Distinctive features | One-sided or double-sided deposition | ||